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Section 1 Introduction
GF100 Series
1-4
Table 1-2 Terms and Acronyms
Term or Acronym
CSR
CVD
DeviceNet
DSP
EPI Epitaxy (EPI).
HBD
GF100 Series
F.S.
LED
MFC
MultiFlo Configurator
MultiFlo Technology
PID
PSIA
PSID
PSIG
PTI
ROR
HC
S.P.
Step Technology
VIU
Installation and Operation Manual
X-TMF-GF100-Series-MFC-eng
Part Number: 541B137AAG
Definition
Customer Special Requirement
Chemical Vapor Deposition
A 5-wire local network I/O communication device
that employs a command/response
communication protocol
Digital Signal Processor
A process technology where a pure silicon
crystalline structure is deposited or "grown" on a
bare wafer, enabling a high-purity starting point
for building the semiconductor device.
Horizontal Base Down
Integrated Flow Controller
Full Scale
Light Emitting Diode
Mass Flow Controller
I/O communication software package that
configures gas and flow ranges
A physics-based calibration methodology that
enables gas and flow range configuration within
a defined standard configuration
Proportional Integral Derivative Controller
Pounds per Square Inch Absolute
Pounds per Square Inch Differential
Pounds per Square Inch Gauge
Pressure Transient Insensitive. Reduces the
effect of pressure fluctuations in gas flow.
Applicable to GF125 only.
As pressure increases, flow increases at a
pressure rate of rise, or ROR.
Standard Configuration w/ Hastelloy® sensors
(to reduce reaction to corrosive gases)
Setpoint
Enables fast set point control through a high
speed DSP and low volume drive circuit
Vertical mounting attitude with inlet side facing up
April, 2017
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