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Section 1 Introduction
®
Brooks
GF40 Devices
1-4
Table 1-2 Terms and Acronyms
Term or Acronym
CSR
CVD
DSP
EPI Epitaxy (EPI).
HBD
HLD
HLU
HUD
GF40 Series
F.S.
LED
MFC
MultiFlo Configurator
MultiFlo Technology
PID
PSIA
PSID
PSIG
ROR
HC
S.P.
Step Technology
VID
VIU
Installation and Operation Manual
X-TMF-GF40-Series-MFC-eng
Part Number: 541B195AAG
Definition
Customer Special Requirement.
Chemical Vapor Deposition.
Digital Signal Processor.
A process technology where a pure silicon
crystalline structure is deposited or "grown" on a
bare wafer, enabling a high-purity starting point
for building the semiconductor device.
Horizontal Base Down.
Horizontal Label Down.
Horizontal Label Up.
Horizontal Upside Down.
MultiFlo capable digital device.
Full Scale.
Light Emitting Diode.
Mass Flow Controller.
I/O communication software package that
configures gas and flow ranges.
A physics-based calibration methodology that
enables gas and flow range configuration within
a defined standard configuration.
Proportional Integral Derivative Controller.
Pounds per Square Inch Absolute.
Pounds per Square Inch Differential.
Pounds per Square Inch Gauge.
As pressure increases, flow increases at a
pressure rate of rise, or ROR.
Standard Configuration w/ Hastelloy
(to reduce reaction to corrosive gases).
Setpoint.
Enables fast set point control through a high
speed DSP.
Vertical mounting attitude with inlet side facing
down.
Vertical mounting attitude with inlet side facing up.
October, 2017
®
sensors
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